Ceramic Targets and Substrates

MSI’s Wet and Dry Chemical Processes allow us to meet our customer’s ceramic target specifications. We work together with our customers to produce their ceramic targets to the highest quality standards in the most cost effective manner. Our advanced bonding process allows us to bond the ceramic targets to almost any backing plates up to 100"long x 20"wide. This includes our state-of-the-art Plasma Sprayed process which is capable of meeting our Customer’s Rotatable Target requirements. MSI also offer single crystal substrates for our customers to produce their high quality thin films such as Al2O3, LaAlO3, MgF2, MgO, SrTiO3, YAG, YSZ and others.

Metal Targets

MSI has established a world wide reputation for its experience in the design, manufacture and service of high purity precious, semi and non precious metal targets and coater components since 1981. Our sputtering and evaporation materials are used in a multitude of thin film coating industrial applications in the aerospace, automotive, decorative, optical, electronic and photovoltaic solar panel display.

Our Planar Targets are designed and manufactured carefully to avoid the introduction of raw material surface contaminants to the thin film coating process, machined to meet customer’s specifications. Our target products are available in segmented planar, monolithic planar and rotatable styles. They may be cast, plasma sprayed or bonded. Our capability to manufacture those targets make us very competitive to other Sputtering Businesses in the world. We can achieve the superior material utilization and lot to lot stability. Our state-of-the-art internal process controls ensure the proper grain size with minimal alloy gradient, regardless of target sizes.

Metals and Metal-Alloy Styles

©2008 Materials Science International, Inc. 1660 Georgesville Road, Columbus, Ohio 43228-3620, U.S.A.